Development of μ-PIC at Kyoto

Kentaro Miuchi(Kyoto University, Japan)

2003 March 19th @EVTEK,Espoo,Finland

Contents1. μ-PIC detector

2. Development History3. Current Status4. Future Works

5. Summary

2003 March 19th Kentaro Miuchi

10cm

1. µ-PIC DetectorMicro Pixel Chamber2-D imaging detector for charged particlesmanufactured by the PCB technology

400μm

100μm

10cm×10cm μ-PIC256anode + 256 cathode stripsFine position resolutionHigh gainDischarge damage: small

2003 March 19th Kentaro Miuchi

3cm

2. Development History

Test Piece (3×3cm2)several pieces up to now~$5,000 /pcfor “trials”(material, technology, …)

10cm

Full size detector (10×10cm2)5 detectors up to now ~$30,000/pc

(including the motherboard.)

(History of the fight against the discharges)

2003 March 19th Kentaro Miuchi

Development of the Full size detectorsstarted in 2000Made by Toshiba

-15 µmCu, Ni, Aupolyimideµ-PIC 3-20 µmCu, Nipolyimideµ-PIC 4,5

-25 µmCu, Ni, Aupolyimideµ-PIC 2+10 µmAnode height

W, Ni, AuElectrode

ceramicsSubstrate

µ-PIC 1Detector

ceramics

Ni+Au

WManufacturing: easy (uniform anode electrodes)Ceramics: Catalytic

discharge conductive not for practical use

2003 March 19th Kentaro Miuchi

Development of the Full size detectors

-15 µmCu, Ni, Aupolyimideµ-PIC 3-20 µmCu, Nipolyimideµ-PIC 4,5

-40 µmCu, Ni, Aupolyimideµ-PIC 2+10 µmAnode height

W, Ni, AuElectrode

ceramicsSubstrate

µ-PIC 1Detector

Polyimide base: betterµ-PIC 2: low gain (<3000)µ-PIC 3: higher gain (~7000)Gold plating: scatters around

discharge conductive

polyimide

Ni+Au

Cu

Bad pixel found in µ-PIC 3

2003 March 19th Kentaro Miuchi

Development of the Full size detectors

-15 µmCu, Ni, Aupolyimideµ-PIC 3-20 µmCu, Nipolyimideµ-PIC 4,5

-40 µmCu, Ni, Aupolyimideµ-PIC 2+10 µmAnode height

W, Ni, AuElectrode

ceramicsSubstrate

µ-PIC 1Detector

u-PIC1

u-PIC３

u-PIC４,５G

AS

GA

IN

102

gas gains 104

µ-PIC 4,5: good performancehigh gain (~15000)stable operation(1000 hours with gain 3000)

2003 March 19th Kentaro Miuchi

Development of the Full size detectorsµ-PIC 4,5: problems to be solvedanode electrodes heights are not uniform large vessel for the plating was preparedµ-PIC 6 will be shipped

at the end of March

2003 March 19th Kentaro Miuchi

3. Current Status (µ-PIC 4,5)Spectrometry

energy resolution FWHM30%@5.9keV

1mm slits

position resolution σ=290µm

Imaging

2003 March 19th Kentaro Miuchi

8 cm

cosmic-ray

1.7μsec=8cm

μ-P

ICY[

cm]

10

0

µ-PIC for Micro-TPCdrift enclosure8cm drift length4.7cm/µs drift V

micro-TPCX,Y information : µ-PICZ information: timing

2003 March 19th Kentaro Miuchi

tracking the charged particles@proton synchrotron(gain~3000)

proton(0.8GeV/c) Λ particle?

good tracking abilityfor large dE/dx particles

2003 March 19th Kentaro Miuchi

tracking the charged particles@laboratory (gain~7000)

90Sr (2.2MeV β)

not enough…more gain

2003 March 19th Kentaro Miuchi

MeV gamma-ray imaging

Astronomy

sensitivity gap2006-

-2000

AstronomyMedical useSafety keeping

2003 March 19th Kentaro Miuchi

Compton γ-ray Imaging

γ

γ’

Double Compton Methodc

event cone

3γ⇒ 1 directionNo background rejectionneeds TOF to know UP or DOWN

γ1

γ2

γ3

COMPTEL

Eγ’, x, y, z

Ee, x, y, z

RECONSTRUCTION

γγ

γγ

φE

mE

m1cos

EEE2

e

'

2e

e'

cc+−=

+=

2003 March 19th Kentaro Miuchi

RECONSTRUCTIONSCHEMATICS

Ee, e

POINT

Our method Methodc

α⇒BG rejection

2003 March 19th Kentaro Miuchi

prototype

IT WORKS!!（for the first time in the world）

NaI

１３３Ba (356keV γ)

typical event

Micro-TPC

γ-ray imaging with micro-TPCelectron track: micro-TPC

+scattered γ: NaI(Tl) scintillator

10°

FULL RECONSTRUCTION

2003 March 19th Kentaro Miuchi

試験結果

reconstructed imagesperformanceangular resolution ～40°

not enough…more gain

source -8cm(Y)Current status of µ-PIC

X-ray: OKmicro-TPCγ-ray imaging

not enough

×10 improvement for minimum ionizing particles

2003 March 19th Kentaro Miuchi

4. Future WorksAmplifier modifications

SONY semi-custom ICASD (amplifier-shaper

-discriminator) chipshaping time 16ns->80ns

Rfeedback100k10k

20mV

8mV

puls

e he

ight now

afterPSpice simulation

test chip is shipped in March 20thpulse height × 2 expected

2003 March 19th Kentaro Miuchi

New plating technology( for µ-PIC 7+, hopefully)

1. Electroless plating 3. Surface etching

基板

anode

2. Via-fill plating 4. Electrode etching

cathode

High and uniform anode electrodes will be made.

2003 March 19th Kentaro Miuchi

Collection efficiency

Near pin

Cathode gap

・・・

・・・

・・・

30%

65%

4%

Drift end points

Geometry studiesSimulation work at Kyoto

(Maxwell + Garfield)μ-PIC4,5Cathode width: 314μmCathode diameter: 260μmAnode height: -20μmAnode diameter: 50μm

2003 March 19th Kentaro Miuchi

High efficiency is expected!!

μ-PIC7 (with new plating technology )Cathode width: 314μmHole diameter: 260μmAnode height: 10μmAnode diameter: 70μm

Collection

Near pin

Gap

・・・

・・・

・・・

97%

2%

<1%

2003 March 19th Kentaro Miuchi

Ｗell type μ-PIC

基板

anode

cathode

3cm test piece with laser machining-->discharge problem

•Technology breakthrough is expected (RIE process?)

•Energy resolutions?

Manufacturing process

AdvantagesNo near pin electronsNo discharge?

2003 March 19th Kentaro Miuchi

5. SummaryDevelopment History

five full-size μ-PICPolyimide base + no gold plating

Current StatusX-ray 2-D imaging detectorMicro-TPCGamma-ray imaging

Future Works new plating technologywell type μ-PIC