WAVE PROPAGATION AND REFRACTIVE INDEX AT EUV AND … · Ch03_NormIncidReflc.ai Professor David...
Transcript of WAVE PROPAGATION AND REFRACTIVE INDEX AT EUV AND … · Ch03_NormIncidReflc.ai Professor David...
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WAVE PROPAGATION AND REFRACTIVE INDEXAT EUV AND SOFT X-RAY WAVELENGTHS
Chapter 3
n = 1 – δ + iβn = 1 φ
k
k′
k′′
Ch03_F00VG.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
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Ch03_WavEq_RefrcIndx1.ai
The Wave Equation and Refractive Index
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
The transverse wave equation is
(3.1)
(3.2)
where na is the average density of atoms, and
For the special case of forward scattering the positions of the electronswithin the atom (∆k ? ∆rs) are irrelevant, as are the positions of theatoms themselves, n(r, t). The contributing current density is then
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Ch03_WavEq_RefrcIndx2.ai
The Wave Equation and Refractive Index (Continued)
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
The oscillating electron velocities are driven by the incident field E
such that the contributing current density is
Substituting this into the transverse wave equation (3.1), one has
Combining terms with similar operators
(3.2)
(3.4)
(3.5)
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Ch03_RefracIndex1.ai
Refractive Index in the Soft X-Rayand EUV Spectral Region
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
Written in the standard form of the wave equation as
The frequency dependent refractive index n(ω) is identified as
For EUV/SXR radiation ω22 is very large compared to the
quantity e2na/e0m, so that to a high degree of accuracy theindex of refraction can be written as
which displays both positive and negative dispersion, dependingon whether ω is less or greater than ωs. Note that this will allowthe refractive index to be more or less than unity, and thus thephase velocity to be less or greater than c.
(3.6)
(3.7)
(3.8)
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Ch03_RefracIndex2.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
Refractive Index in the Soft X-Rayand EUV Spectral Region (continued)
Noting that
and that for forward scattering
where this has complex components
The refractive index can then be written as
which we write in the simplified form
(3.8)
(3.9)
(3.12)
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Ch03_RefrcIndxIR.XR.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
Refractive Index from theIR to X-Ray Spectral Region
•λ2 behavior•δ & β << 1•δ-crossover
(3.12) (3.13a)
(3.13b)
1
0Infrared Visible Ultraviolet
Ultraviolet
Ref
ract
ive
inde
x, n
X-rayωIR ωUV ωK,L,M
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Ch03_PhasVelo_Refrc1.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
Phase Velocity and Refractive Index
The wave equation can be written as
(3.10)
(3.11)
The two bracketed operators represent left and right-running waves
where the phase velocity, the speed with which crests offixed phase move, is not equal to c as in vacuum, but rather is
z z
Right-running waveLeft-running wave
EE
Vφ = – Vφ = cn
cn
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Ch03_PhasVelo_Refrc2.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
Phase Velocity and Refractive Index (continued)
Recall the wave equation
(3.10)
Examining one of these factors, for a space-time dependence
Solving for ω/k we have the phase velocity
ET = E0 exp[–i(ωt – kz)]
Vφ =
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Ch03_PhaseVarAbsrb.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
Phase Variation and Absorptionof Propagating Waves
For a plane wave (3.14)
(3.15)
(3.16)
(3.17)
in a material of refractive index n, the complex dispersion relation is
Solving for k
or
where the first exponential factor represents the phase advance had thewave been propagating in vacuum, the second factor (containing 2πδr/λ)represents the modified phase shift due to the medium, and the factorcontaining 2πβr/λ represents decay of the wave amplitude.
Substituting this into (3.14), in the propagation direction definedby k ? r = kr
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Ch03_IntenstyAbsrp.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
Intensity and Absorption in a Materialof Complex Refractive Index
For complex refractive index n
The average intensity, in units of power per unit area, is
or
orthe wave decays with an exponential decay length
Recalling that
(3.18)
(3.19)
(3.20)
(3.17)
(3.21)
(3.22)
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Ch03_AbsorpLngths.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
Absorption Lengths
(3.23)
Recalling that β = nareλ2f2(ω)/2π°
In Chapter 1 we considered experimentally observed absorptionin thin foils, writing
where ρ is the mass density, µ is the absorption coefficient, r is thefoil thickness, and thus labs = 1/ρµ. Comparing absorption lengths,the macroscopic and atomic descriptions are related by
where ρ = mana = Amuna , mu is the atomic mass unit, and A isthe number of atomic mass units
(3.22)
(3.24)
(3.26)
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Ch03_PhaseShift.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
Phase Shift Relative to Vacuum Propagation
(3.23)
(3.29)
For a wave propagating in a medium of refractive index n = 1 – δ + iβ
the phase shift ∆φ relative to vacuum, due to propagation througha thickness ∆r is
•Flat mirrors at short wavelengths•Transmissive, flat beamsplitters•Bonse and Hart interferometer•Diffractive optics for SXR/EUV
Reference wave
Object wave
Object∆r
M
M BS
BS
Filmor CCD
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Ch03_ReflctnRefrctn.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
Reflection and Refraction at an Interface
z Refractedwave
ReflectedwaveIncident
wave
x
k′
k′′k
φ′
φ′′φ
n = 1 – δ + iβVacuum
n = 1
incident wave:
refracted wave:
reflected wave:
(3.30a)
(3.30b)
(3.30c)
(1) All waves have the same frequency, ω, and |k| = |k′′| =(2) The refracted wave has phase velocity
ωc
ωc
ω′c′
cnVφ = = , thus k′ = |k′| = (1 – δ + iβ)
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Ch03_BndryConditns.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
Boundary Conditions at an Interface
•E and H components parallel to the interface must be continuous
(3.32a)
(3.32b)
(3.32c)
(3.32d)
•D and B components perpendicular to the interface must be continuous
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Ch03_SpatialContin.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
Spatial Continuity Along the Interface
Continuity of parallel field components requires
(3.34a)
(3.33)
(3.34b)
(3.35a)
(3.35b)∴
(3.36)
(3.38)
Conclusions:
Since k = k′′ (both in vacuum)
k = and k′ = =
sinφ = n sinφ′
The angle of incidence equalsthe angle of reflection
Snell’s Law, which describesrefractive turning, for complex n.
z
x
k′
k′ sinφ′
k′′ sinφ′′k sinφ
k k′′
φ′
φ′′φ
n = 1 – δ + iβVacuum
n = 1
ωc
ω′c/n
nωc
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Ch03_TotalExtrnlRflc1.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
Total External Reflectionof Soft X-Rays and EUV Radiation
Snell’s law for a refractive index of n . 1 – δ, assuming that β → 0
Consider the limit when φ′ →
Glancing incidence (θ < θc) andtotal external reflection
π2
1 =sin φc1 – δ
The critical angle for totalexternal reflection.
(3.41)
(3.39)
(3.40)
φ′ > φ
θ + φ = 90°
φ′
φθ
θ < θcθc
Critical ray
Totallyreflectedwave
Exponential decay of the fields into the medium
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Ch03_TotalExtrnlRflc2.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
Total External Reflection (continued)
The atomic density na, varies slowly among the naturalelements, thus to first order
(3.41)
(3.42a)
(3.42b)
where f1 is approximated by Z. Note that f1 is a complicatedfunction of wavelength (photon energy) for each element.
° °
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Ch03_TotalExtrnlReflc3.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
Total External Reflection with Finite b
Glancing incidence reflectionas a function of β/δ
. . . for real materials
•finite β/δ rounds the sharp angular dependence
•cutoff angle and absorption edges can enhance the sharpness
•note the effects of oxide layers and surface contamination
1
0.5
00 0.5 1 2 31.5 2.5
θ/θc
ABC
D E
A: β/δ = 0
B: β/δ = 10–2
C: β/δ = 10–1
D: β/δ = 1
E: β/δ = 3
Ref
lect
ivity
100
(Henke, Gullikson, Davis)
1,000 10,000
100
0
100
0
100
80
60
40
20
80
60
40
20
80
60
40
20
0
100
80
60
40
200
Ref
lect
ivity
(%
)R
efle
ctiv
ity (
%)
Ref
lect
ivity
(%
)R
efle
ctiv
ity (
%)
Photon energy (eV)
Gold (Au)
Aluminum Oxide(Al2O3)
Aluminum (Al)
Carbon (C)30 mr
30 mr
30 mr
80 mr
80 mr
80 mr(4.6°) (1.7°)
80 mr
30 mr
(a)
(b)
(c)
(d)
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Ch03_NotchFilter.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
The Notch Filter
• Combines a glancing incidence mirror and a filter• Modest resolution, E/∆E ~ 3-5• Commonly used
Mirrorreflectivity(“low-pass”)
Absorptionedge Filter
transmission(“high-pass”)
Photon energy
1.0
Filter/reflectorwith responseE/∆E . 4
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Ch03_ReflecInterf1.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
Reflection at an Interface
E0 perpendicular to the plane of incidence (s-polarization)
tangential electric fields continuous
(3.43)
(3.44)
(3.45)
tangential magnetic fields continuous
Snell’s Law:Three equations in three unknowns(E0, E0, φ′) (for given E0 and φ)′ ′′
H′′ cosφ′′H cosφ
H′ cosφ′
z
x
H′
E′
E′′E
H′′H
φ′
φ′
φ′′φ
φ φ′′
n = 1 – δ + iβn = 1
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Ch03_ReflecInterf2.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
Reflection at an Interface (continued)
E0 perpendicular to the plane of incidence (s-polarization)
The reflectivity R is then
With n = 1 for both incident and reflected waves,
Which with Eq. (3.46) becomes, for the case of perpendicular (s) polarization
(3.47)
(3.46)
(3.48)
(3.49)
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Ch03_NormIncidReflc.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
Normal Incidence Reflection at an Interface
Normal incidence (φ = 0)
For n = 1 – δ + iβ
Example: Nickel @ 300 eV (4.13 nm)From table C.1, p. 433f1 = 17.8 f2 = 7.70δ = 0.0124 β = 0.00538
R⊥ = 4.58 × 10–5° °
Which for δ << 1 and β << 1 gives the reflectivity for x-ray and EUVradiation at normal incidence (φ = 0) as
(3.49)
(3.50)
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Ch03_GlancIncidReflc.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
Glancing Incidence Reflection (s-polarization)
For
For n = 1 – δ + iβ
where
(3.49)
A: β/δ = 0B: β/δ = 10–2
C: β/δ = 10–1
D: β/δ = 1E: β/δ = 3
1
0.5
00 0.5 1 2 31.5 2.5
θ/θc
A
BC
D E
Ref
lect
ivity
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Ch03_ReflecInterf3.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
Reflection at an Interface
E0 perpendicular to the plane of incidence (p-polarization)
(3.54)
(3.55)
(3.56)
The reflectivity for parallel (p) polarization is
which is similar in form but slightly differentfrom that for s-polarization. For φ = 0 (normalincidence) the results are identical.
E′′ cosφ′′E cosφ
E′ cosφ′H′
z
x
E′
E′′
H′′H
E
φ′
φ′
φ′′φ
φ φ′′
n = 1 – δ + iβn = 1
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Ch03_BrewstersAngle.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
Brewster’s Angle for X-Rays and EUV
For p-polarization
(3.56)
(3.58)
(3.59)
(3.60)
There is a minimum in the reflectivitywhere the numerator satisfies
Squaring both sides, collecting like termsinvolving φB, and factoring, one has
or
the condition for a minimum in the reflectivity,for parallel polarized radiation, occurs at an anglegiven by
For complex n, Brewster’s minimum occurs at
or
k′
E′
n = 1 – δ + iβ
sin2Θradiationpattern
n = 1
k′′
k
0
E 0
φB
E′′ = 0
0
90°
S
P
W4.48 nm
0
Ref
lect
ivity
45° 90°
1
10–2
10–4
10–6
Incidence angle, φ
(Courtesy of J. Underwood)
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Ch03_FocusCurv.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
Focusing with Curved, Glancing Incidence Optics
The Kirkpatrick-Baez mirror system
• Two crossed cylinders (or spheres)• Astigmatism cancels• Fusion diagnostics• Common use in synchrotron radiation beamlines• See hard x-ray microprobe, chapter 4, figure 4.14
(Courtesy of J. Underwood)
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Ch03_Determining.ai
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
Determining f1 and f20 0
• f2 easily measured by absorption• f1 difficult in SXR/EUV region• Common to use Kramers-Kronig relations
(3.85a)
(3.85b)
• Possible to use reflection from clean surfaces; Soufli & Gullikson• With diffractive beam splitter can use a phase-shifting interferometer; Chang et al.• Bi-mirror technique of Joyeux, Polack and Phalippou (Orsay, France)
as in the Henke & Gullikson tables (pp. 428-436)
0
0