Wafer surface inspection and cleaning performance test 2021.11

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1. ウェハ表面検査・洗浄性能試験について 1 製品一覧ページ: https://www.t-dylec.net/field/field14/#semicon-parts1

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Wafer surface inspection and cleaning performance test_2021.11.22
7 nm 3 nm
1.3

5
1XModel 3482 2 VSP-G1 3 Model 3082DMA (Model 3081A/3085A )
Model 3482

Model 3082 DMA (Model 3081A/3085A )

: 2150 nm : 107 /cm3
D×W×H) : 356 x 180 x 140 mm : 3.6 kg : 100 240 VAC 5060Hz 30W () : 210 μL/min
20nm
X
: 1 atom20 nm : Cu/Au/Ag/Pt/W/Ni () : 0.01100 mg/h : 0.01100 mg/h () : 1081011 /cm3 () : 110240 VAC (D×W×H): 520 x 300 x 200 mm : 19 kg : 130 L/min : N2, Ar



(2) VSP-G1
8 1150 nm Long DMA (Model 3081A) 1.5 200 nm Nano DMA (Model 3085A)
X (Model 3088) 75125 kPa 1040 0.23 L/min 230 L/min
(D×W×H):405×282×405 mm
(Model 3082)
Model 3082 Long DMA (Model 3081A) Nano DMA (Model 3085A)
(3) Model 3082DMA (Model 3081A/3085A )
Water-based CPC 3789 AeroTrak Model 9001 MAIS-10 110A Series 110A Spot Sampler
2.2
Aero Trak Model 9001
MAIS-10
110A Series 110A Spot Sampler
2.2 nm or 7 nm 10 nm 30 nm 5 nm

10


2 nm1,000 nm (SMPS) 50 Hz
Model 3082
: 10 nm1 μm : 2.83 L/min : (D×W×H): 246 x 218 x 569 mm : 13 kg


12
: 0.038.6 μm10 : 9 L/min±10 : 2.0 kg () (D×W×H) : 120 x 120 x 370 mm : : φ25 mm ()
50
5 nm2.5 μm >95% 5 nm10 μm >90 %
3
1 24
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Sequential Spot Sampler (Model: SSS110A)
Universal Spot Sampler (Model: SS110A)
5 nm 2.5 µm () 5 nm 10 µm () 1.0 – 1.5 L/min () >95% () >90% () 8.0 kg (D×W×H)500 x 305 x 255 mm
(4) 110A Series 110A Spot Sampler
1 CPC3756 2 CPC3750 31 nm 1 nmSMPS3938E57
15
03×105 /cm3 ()
n-
(D×W×H)353 x 281 x 301 mm
•3×105 /cm3
(2) CPC3750
7 nmSucrose3 μm 0105 /cm3 () n- 10 kg (D×W×H)299 x 183 x 275 mm

•64 ch/decade


1 nm (NaCl) 03.0×105 /cm3 1.65×105±10 3×105±15 (DEG) n- 2.5 L/min 1.0 L/min 1.5 L/min (D×W×H) : 325 × 282 × 575 mm (3757-50)
: 325 × 282 × 300 mm (3757)