Mask Aligner - Seiwa America

SEIWA OPTICAL AMERICA INC 3042 Scott Blvd Santa Clara, CA 95054 Tel: +408 - 844 - 8008 Fax: +408 - 844 - 8944 http://www.seiwaamerica.com Wafer Size 4, 5, 6 inch (Si, GaAs, Ceramic and etc.) Mask Size Exposure Mode Exposure Gap 0 - 100 μm ( Resolution: 1μm) Proximity, Hard Contact, Soft Contact Resolution UV Lamp 500W, 20 mW/cm² Light Collimation Angle ≤ 1.0° (Half Angle) Objective Lens Camera Unit X, Y, Z, θ Stage (AC Servo Driven) Light Source Light Distribution Alignment Accuracy Stage Dimensions Weight 5, 6, 7 inch L/S 1μm at Hard Contact More than 90% ( ± 5%) ≤ 1.5° Light Declination Angle Approx. 1,500 Kg Approx. 1,500 (W) x 1,300 (D) x 1,667 (H)mm 1/2 inch CCD Camera (4 Sets) Top Surface ±1μm, Back Surface ±2μm Top Side: 5X or 10X or 20X Back Side: 10X (Fixed) • High accuracy alignment for both top an back surface by a high resolution objective lens • High accuracy paralleling mechanism (Wafer to Mask) • Precise pressure control for the mask contact • Auto wafer transportation and auto alignment • Precise gap control by laser beam sensor (Gas sensing and feedback) Features Specifications Descriptions Options The following models are available: PA-150MAD: Manual alignment system PA-150AADC: Auto alignment and cassette to cassette wafer transportation system Utilities Line Power: AC200V, 3 Phase, 15A Vacuum: 600mm Hg (1/4 inch, Female) Compressed air: 0.4 Mpa, 50 litre/nl (1/4 inch, Female, Swagelock) The PA-150AAD-C is designed to meet requirements of pilot lines and mass production lines of "MEMS Wafer", "Opt-devices", "Communication Devices", "DNA chips", and "Bump", process as well. The system enables high resolution exposure, because the system has an auto-alignment function for both top and back surface of wafer, and has three modes in exposure process, proximity, hard contact and soft contact mode. Process Equipment Mask Aligner

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Transcript of Mask Aligner - Seiwa America

SEIWA OPTICAL AMERICA INC3042 Scott Blvd

Santa Clara, CA 95054

Tel: +408 - 844 - 8008Fax: +408 - 844 - 8944

http://www.seiwaamerica.com

Wafer Size 4, 5, 6 inch (Si, GaAs, Ceramic and etc.)

Mask SizeExposure ModeExposure Gap 0 - 100 μm ( Resolution: 1μm)

Proximity, Hard Contact, Soft Contact

ResolutionUV Lamp 500W, 20 mW/cm²

Light Collimation Angle ≤ 1.0° (Half Angle)

Objective Lens

Camera Unit

X, Y, Z, θ Stage (AC Servo Driven)

Light SourceLight Distribution

Alignment Accuracy

Stage

Dimensions

Weight

5, 6, 7 inch

L/S 1μm at Hard Contact

More than 90% ( ± 5%)

≤ 1.5°Light Declination Angle

Approx. 1,500 Kg

Approx. 1,500 (W) x 1,300 (D) x 1,667 (H)mm

1/2 inch CCD Camera (4 Sets)

Top Surface ±1μm, Back Surface ±2μm

Top Side: 5X or 10X or 20X Back Side: 10X (Fixed)

• High accuracy alignment for both topan back surface by a high resolutionobjective lens

• High accuracy paralleling mechanism(Wafer to Mask)

• Precise pressure control for the maskcontact

• Auto wafer transportation and autoalignment

• Precise gap control by laser beamsensor(Gas sensing and feedback)

Features

Specifications Descriptions

Options

The following models are available:PA-150MAD: Manual alignment systemPA-150AADC: Auto alignment and cassette to cassette wafer transportation system

Utilities

Line Power: AC200V, 3 Phase, 15A Vacuum: 600mm Hg (1/4 inch, Female) Compressed air: 0.4 Mpa, 50 litre/nl(1/4 inch, Female, Swagelock)

The PA-150AAD-C is designed to meet requirements of pilot lines and mass production lines of "MEMS Wafer", "Opt-devices", "Communication Devices", "DNA chips", and "Bump", process as well.

The system enables high resolution exposure, because the system has an auto-alignment function for both top and back surface of wafer, and has three modes in exposure process, proximity, hard contact and soft contact mode.

Process Equipment

Mask Aligner