Making Uniform Thin Films

Making Uniform Thin FilmsBrett Bostrom, Dr. R. Steven Turley, Dr. David AllredBrigham Young UniversityThe SkinnyNo one universal reflector for XUV

Changing thickness changes behavior ( = 2ndcos)

Uniformity is crucial!

Substrate (Silicon Wafer, Glass, etc.)1 100 nmThin FilmThe Process of DepositionDifferent methods for deposition

Thermal Evaporation

Magnetron Sputtering_+ Ar ions+ Ar ionsMetal AtomsHigh-Voltage Power SupplySubstrateStageTargetMagnetComplicationsHigh Vacuum

Oxidation

Uniformity

Magnetic fieldReducing Thickness VarianceStepper Motor

Planetary Gears

Multiple revolutions

Steps to degrees

Revolutions

Initial/Final positionsStageTargetExpected ResultsAutomated system

More Consistent results

More Uniform films

StationaryRevolution onlyComparison

Planetary motion

AcknowledgmentsDr. Turley

Dr. Allred

John Ellsworth

Chris Cosio

James Vaterlaus