: :.
() , : 1. 2.E 3.
( ) (, - ) ( - , .) ()
: (PVD,CVD,EBE,IBE,LPD) (ECD) (plasma spraying) : () (MOVPE)
PVD :
:
(thin films,coatings)
(multilayered structures)
(carrier gas)
(ion plating)
E
Work-accelerated gun
Self-accelerated gun
:
(Growth modes)
Growth process
Growth parameters
Layer thickness
Strained layers
;
=- + +
: = = =
=0 3-D > Volmer-Weber < Frank van der Merve Stranski - Krastanov
VW ( )
ZnSe /(Zn,Cd)Se
-: , , ,
GaAs
ZeSe GaAs
ZnSe /(Zn,Cd)Se
(10^-12 mbar) / (310 C)
(RD,SEM) (Raman/IR, PR/PL, Ellipsometry) (I-V,C-V,Hall condactivity) (crystal monitor detector,ellipsometry)
Handbook of deposition technologies for films and coatings(Rointan F. Bunshah)Handbook of chemical vapor depositon(Hugh O. Pierson)Thermal analysis of materials(Robert F.Speyer)Science and engineering of materials (Donald R. Askeland)The dynamics of thin film growth:A modeling study (M.A. Gallivan, R.M. Murray, D.G. Goodwin)Internet(Wikipedia)
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