Download - Φυσικές διεργασίες παραγωγής λεπτών υμενίων και στρωματικών υλικών

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  • : :.

  • () , : 1. 2.E 3.

  • ( ) (, - ) ( - , .) ()

  • : (PVD,CVD,EBE,IBE,LPD) (ECD) (plasma spraying) : () (MOVPE)

  • PVD :

    :

  • (thin films,coatings)

    (multilayered structures)

    (carrier gas)

  • (ion plating)

  • E

    Work-accelerated gun

    Self-accelerated gun

    :

  • (Growth modes)

    Growth process

    Growth parameters

    Layer thickness

    Strained layers

  • ;

    =- + +

    : = = =

    =0 3-D > Volmer-Weber < Frank van der Merve Stranski - Krastanov

  • VW ( )

  • ZnSe /(Zn,Cd)Se

    -: , , ,

    GaAs

  • ZeSe GaAs

  • ZnSe /(Zn,Cd)Se

    (10^-12 mbar) / (310 C)

  • (RD,SEM) (Raman/IR, PR/PL, Ellipsometry) (I-V,C-V,Hall condactivity) (crystal monitor detector,ellipsometry)

  • Handbook of deposition technologies for films and coatings(Rointan F. Bunshah)Handbook of chemical vapor depositon(Hugh O. Pierson)Thermal analysis of materials(Robert F.Speyer)Science and engineering of materials (Donald R. Askeland)The dynamics of thin film growth:A modeling study (M.A. Gallivan, R.M. Murray, D.G. Goodwin)Internet(Wikipedia)