Superconductive Magnetoresistive Random-Access Memory (JMRAM)

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SUPERCONDUCTIVE MAGNETORESISTIVE RANDOM- ACCESS MEMORY (JMRAM) By Charles Nathan Cardinell Mentor Nathan Newman

description

Superconductive Magnetoresistive Random-Access Memory (JMRAM). By Charles Nathan Cardinell Mentor Nathan Newman. Objective. To create a RAM that requires very little power Resistive to Radiation Damage Fast Switching. Memory Comparision. JMRAM has a faster read/write time - PowerPoint PPT Presentation

Transcript of Superconductive Magnetoresistive Random-Access Memory (JMRAM)

Page 1: Superconductive  Magnetoresistive  Random-Access Memory (JMRAM)

SUPERCONDUCTIVE MAGNETORESISTIVE RANDOM-ACCESS MEMORY (JMRAM)By

Charles Nathan Cardinell

Mentor

Nathan Newman

Page 2: Superconductive  Magnetoresistive  Random-Access Memory (JMRAM)

Objective• To create a RAM that requires very little power• Resistive to Radiation Damage• Fast Switching

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Memory Comparision

  FLASH DRAM SRAM JMRAM (projected)

Cell Size (μm^2) 0.04 0.03 0.3 <1.25

Read Time (ns) 10 - 50 10 1 <5

Write Time .1 - 100 ms 10 ns 1 ns <5 ns

Write Energy per Bit 10 nJ5 pJ (Requires

Refresh) 5 pJ 4 - 10 pJEndurance (read/write) 10^15/10^5 10^15 10^15 10^15

Non-Volatillitile Yes No No Yes

• JMRAM has a faster read/write time• JMRAM is low power• JRAM has high endurance

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Review of Magnetoresistive Random-Access Memory (MRAM)

• Non-Volatile• Data stored as a magnetic element

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Review of Superconductive Magnetoresistive Random-Access Memory (JMRAM)

• Uses Josephson Junctions• Faster then Normal MRAMs

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Growth of the JMRAM

• (Ultra-High Vacuum) UHV chamber

• 4 guns and targets• Large temperature range

• Vacuum to 10-9 Torr• Sapphire and Silica substrates

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Types of Devices

Shadow Mask

• Advantages• Cheap• Fast

• Disadvantages• Larger Device Area• Poorer Quality Films• Less Consistant

Processed

• Advantages• Multiple Device Sizes• Multiple Devices• Better Quality Films• Less Pin Holes

• Disadvantage• Expensive• More Chances for a mistake

to occur

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Processing of the JMRAM

Step #1: Reduced Working Area Etch

Step #2: Junction Definition Etch

Step #3: Silica Dioxide Deposition

Step #4: Via Etch

Step #5: Metal Liftoff

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Measuring the JMRAM

• Done in a shielded room

• Wide range of temperatures and magnetic fields

• Digital Systems Used

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Results

-4.00 -3.00 -2.00 -1.00 0.00 1.00 2.00 3.00 4.00

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NHP4-1 at 5.3K, Ic=34uA, Rn=8.3 Ohm.

mAConductance

mV

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Conclusions

JMRAM has the possibility to be used in a wide range of areas such as

• Satellites• Banks• Search Engines• Databases

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THANK YOUQuestions?