Mask Projection Micro Stereolithography

Click here to load reader

  • date post

    10-Dec-2015
  • Category

    Documents

  • view

    43
  • download

    6

Embed Size (px)

description

Mask Projection Micro Stereolithography

Transcript of Mask Projection Micro Stereolithography

  • Mask Projection Micro StereolithographyHessel Maalderink

    Precisiebeurs, woensdag 30 November 2011

  • Stereolithography

    Courtesy CustomPartNet

  • Micro Stereo Lithography

    Voxel size

    S

    c

    a

    l

    e

    Laser (2 photon)

    Laser

    Mask projection

    nm m mmCourtesy Laser Zentrum Hannover

  • Micro Stereo Lithography

    Applications:PrototypingMasterRapid Manufacturing

    Fields of operation:Medical DevicesElectronics / TelecomSensorsMicro fluidic systemsMechanical componentsMould makingJewelry

    Courtesy RapidShape

  • DLP machine principle Spindle

    Load cell

    Platform

    Reservoir

    Mirror

    Steppermotor

    Projector

    Shutter

  • Micro Stereo Lithography

    3D Cad file STL file BitmapsTo project

    Work flow

    SLA part

  • Introduction to micro stereolithography

    Glass

    Light curable resinCured Resin

    Z-stage

    DLP Projector

  • Micro stereolithography

    Glass

    Light curable resinCured Resin

    Z-stage

    DLP Projector

  • Micro stereolithography

    Glass

    Light curable resinCured Resin

    Z-stage

    DLP Projector

  • Micro stereolithography

    Glass

    Light curable resinCured Resin

    Z-stage

    DLP Projector

  • Micro stereolithography

    Glass

    Light curable resinCured Resin

    Z-stage

    DLP Projector

  • Micro stereolithography

    Glass

    Light curable resinCured Resin

    Z-stage

    DLP Projector

    Force feedback mechanism

  • Micro Stereo Lithography

    The Lepus System

    Closed LoopForce feedback

    Layertime reduced to 3 seconds

  • Projecion: DLP, blueMotion Control: Force Feedback loopResolution: 1920 x 1080 pixelsPixel size 50 80 mLayer thickness: 25 100 mBuild envelope: 96x54x120 mm .. 154x87x120 mmBuild speed: 50 m : up to 45 mm per hour

    100 m : up to 90 mm per hour

    Process prototyping

  • Process prototypingProjecion: DLP, UVMotion Control: Force Feedback loopResolution: 1024 x 768 pixelsPixel size 4 mLayer thickness: 5 25 mBuild envelope: 40x30mm (4x3 mm)Stepping: Yes

  • SLADevelopment of custom additive manufacturing

    systems, in a B2B consortium with industrial partners

    Dental

    Hearing aid

    Jewelry

    Courtesy RapidShape

  • Hessel Maalderink Confidential

    16

    Geometric part quality influences

    Pressure build-up

    Support

    LayersOptimizations: pixel size, layer thickness, design

    1. LMT inherent limitations

    2. Equipment quality

    3. Material behavior

  • Hessel Maalderink Confidential

    17

    Geometric part quality influences

    Optimizations: equipment design, optical corrections

    Z stagealignmentZ accuracyXY accuracy

    Light engineAlignmentStabilityPicture quality

    1. LMT inherent limitations

    2. Equipment quality

    3. Material behavior

    GeometricSize & Aspect ratioTrapezoid & Cushion

    Non geometricFocusLense flare, reflectionsIntensity variations (local)

  • Hessel Maalderink Confidential

    18

    Geometric part quality influences

    Optimizations: filled matrerials, smart illumination

    1. LMT inherent limitations

    2. Equipment quality

    3. Material behavior

    Through-cure (Z-bonus)Shrinkage

    Curing shrinkageThermal shrinkage

    Results in: - XY error- interlayer tension =>curl

  • Hessel Maalderink Confidential

    19

    Smart correctionsOptical correction in slicerBoundary offset

    Smart iIllumination strategyGrey pixels

    Boundary improvementTension reduction (difference in contour and inner illumination)

  • Hessel Maalderink Confidential

    20

    Geometric part quality influences

    Geometric part quality is influenced by many factors.Special test geometries are needed to isolate them.

    Benchmark Part

    AnglesHoles,Small featuresAccuracyInternal channelsZ-bonus

  • Micro Stereo Lithography

    Benchmark Part

    Small features

  • Micro stereolithography - examples

    Hearing aids

    Courtesy of Widex

  • Layer thickness: 0.01 mm

    TNO TNO

    Total Height: 2,7 mm

    Micro stereolithography - examples

  • Digital Light Processing Research. Stepping to build larger parts with High Resolution.

    TNO TNO

    Micro stereolithography - examples

  • Micro fluidic structure

    Courtesy D-Mec

    Micro stereolithography - examples

  • Ongoing research: Processing highly filled material

  • Viscosity modification through dispersing agents

    1,0E+02

    1,0E+03

    1,0E+04

    1,0E+05

    1,0E+06

    1 10 100

    Shear rate (1/s)

    V

    i

    s

    c

    o

    s

    i

    t

    y

    (

    m

    P

    a

    .

    s

    )

    75wt% no disp

    74 wt %

    80 wt %

    87 wt %

    89 wt %

    90 wt %

  • Optical characteristicsLight scattering due to ceramic particles influences spatial resolution of the uSLA process

    Important parametersParticle size distributionRefractive index of ceramic particleRefractive index of photopolymerAbsorption coefficient of ceramic particle

  • First results

    Al2O3 SiC

  • High Filled SLADevelopment of additive manufacturing systems for high

    filled materials, with partners in industry and research.

    Next Step

    Magnetic

    Metals

    Pizo

    Biomaterial

    Ceramics

    Organic

    ZrO2

    AlN

    Al2O3

    Ceramics

    SiO2

    SiC

  • 31

    Micro Stereo Lithography

    Questions