Making Uniform Thin Films

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Making Uniform Thin Films. Brett Bostrom , Dr . R. Steven Turley, Dr. David Allred Brigham Young University. “The Skinny”. No one universal reflector for XUV Changing thickness changes behavior ( Γ = 2n d cos β ) Uniformity is crucial!. 1 – 100 nm. Thin Film. - PowerPoint PPT Presentation

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Making Uniform Thin Films

Making Uniform Thin FilmsBrett Bostrom, Dr. R. Steven Turley, Dr. David AllredBrigham Young UniversityThe SkinnyNo one universal reflector for XUV

Changing thickness changes behavior ( = 2ndcos)

Uniformity is crucial!

Substrate (Silicon Wafer, Glass, etc.)1 100 nmThin FilmThe Process of DepositionDifferent methods for deposition

Thermal Evaporation

Magnetron Sputtering_+ Ar ions+ Ar ionsMetal AtomsHigh-Voltage Power SupplySubstrateStageTargetMagnetComplicationsHigh Vacuum

Oxidation

Uniformity

Magnetic fieldReducing Thickness VarianceStepper Motor

Planetary Gears

Multiple revolutions

Steps to degrees

Revolutions

Initial/Final positionsStageTargetExpected ResultsAutomated system

More Consistent results

More Uniform films

StationaryRevolution onlyComparison

Planetary motion

AcknowledgmentsDr. Turley

Dr. Allred

John Ellsworth

Chris Cosio

James Vaterlaus