Laser Polishing of SLE-Surfaces - Fraunhofer ILT · with SLE and LP (fused silica). 2 Chess...

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In comparison to conventional polishing methods, laser polishing achieves a favorable small micro roughness (rms < 1 nm, spatial wavelength λ < 100 µm). Laser polishing can be adapted to a variety of surface shapes and glass materials (Fused silica, BK7, ULE…) with high processing rates of 1 - 10 cm²/s. Combination of SLE and Laser Polishing With the combination of SLE and laser polishing, complex surface geometries with polished surfaces can be manufac- tured. Due to the thermal process of laser polishing, even the roughness of inner surfaces can be reduced. Hence, with SLE generated micro channels can be post processed e.g. for visual observations of microfluidic processes. sTypical applications of the fabricated glass parts are e.g. microfluidics, microoptics, prototypes, parts for sensors. Contact Christian Weingarten Telephone +49 241 8906-282 [email protected] Dr. Edgar Willenborg Telephone +49 241 8906-213 [email protected] Selective Laser Etching (SLE) SLE is a laser based process to manufacture complex glass parts even with inner geometries e. g. microchannels. By focusing ultrashort laser pulses (300 - 3000 fs) into fused silica the material’s solubility in e. g. KOH is increased by a factor of 1000. A subsequent etching step removes the illuminated material and hence enables the precise (< 10 µm) manufac- turing of three-dimensional cavities in and on glass substrates. But, as a result of the structuring and the etching process the roughness of the fabricated surfaces is too high (approx. 0.2 µm rms) for many applications. Hence, for smooth surfaces an additional process step is necessary. Laser Polishing Polishing glass materials with CO 2 laser radiation is based on the absorption of the laser radiation in a thin surface layer of the work piece. Due to the absorption the surface temperature can be increased above softening temperature. As a result, the viscosity of the material is reduced so that the roughness flows and the surface is smoothened due to surface tension. 1 Aspheres manufactured with SLE and LP (fused silica). 2 Chess figures. 3 Microfluidic (right: SLE-surface, left: laser polished). LASER POLISHING OF SLE-SURFACES Subject to alterations in specifications and other technical information. 07/2017 Fraunhofer Institute for Laser Technology ILT, www.ilt.fraunhofer.de DQS certified by DIN EN ISO 9001, Reg.-No.: DE-69572-01 2 1 3

Transcript of Laser Polishing of SLE-Surfaces - Fraunhofer ILT · with SLE and LP (fused silica). 2 Chess...

Page 1: Laser Polishing of SLE-Surfaces - Fraunhofer ILT · with SLE and LP (fused silica). 2 Chess figures. 3 Microfluidic (right: SLE-surface, left: laser polished). LASER POLISHING

In comparison to conventional polishing methods, laser

polishing achieves a favorable small micro roughness

(rms < 1 nm, spatial wavelength λ < 100 µm). Laser polishing

can be adapted to a variety of surface shapes and glass

materials (Fused silica, BK7, ULE…) with high processing

rates of 1 - 10 cm²/s.

Combination of SLE and Laser Polishing

With the combination of SLE and laser polishing, complex

surface geometries with polished surfaces can be manufac-

tured. Due to the thermal process of laser polishing, even the

roughness of inner surfaces can be reduced. Hence, with SLE

generated micro channels can be post processed e.g. for visual

observations of microfluidic processes. sTypical applications of

the fabricated glass parts are e.g. microfluidics, microoptics,

prototypes, parts for sensors.

Contact

Christian Weingarten

Telephone +49 241 8906-282

[email protected]

Dr. Edgar Willenborg

Telephone +49 241 8906-213

[email protected]

Selective Laser Etching (SLE)

SLE is a laser based process to manufacture complex glass

parts even with inner geometries e. g. microchannels. By

focusing ultrashort laser pulses (300 - 3000 fs) into fused silica

the material’s solubility in e. g. KOH is increased by a factor

of 1000. A subsequent etching step removes the illuminated

material and hence enables the precise (< 10 µm) manufac-

turing of three-dimensional cavities in and on glass substrates.

But, as a result of the structuring and the etching process the

roughness of the fabricated surfaces is too high (approx. 0.2 µm

rms) for many applications. Hence, for smooth surfaces an

additional process step is necessary.

Laser Polishing

Polishing glass materials with CO2 laser radiation is based on

the absorption of the laser radiation in a thin surface layer of

the work piece. Due to the absorption the surface temperature

can be increased above softening temperature. As a result, the

viscosity of the material is reduced so that the roughness flows

and the surface is smoothened due to surface tension.

1 Aspheres manufactured

with SLE and LP (fused silica).

2 Chess figures.

3 Microfluidic (right: SLE-surface,

left: laser polished).

LASER POLISHING OF SLE-SURFACES

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Fraunhofer Institute for Laser Technology ILT, www.ilt.fraunhofer.de

DQS certified by DIN EN ISO 9001, Reg.-No.: DE-69572-01

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