Introduction to HTS Microwave Plasma Cleaner

Introduction to HTS Microwave Plasma Cleaner

立盈科技Highlight Tech. System

Plasma Surface Treatments

Plasma Generation by Microwave• Energy transfer by collisions between electrons and

neutral particles.

22

2 2( )( )( )2o

mm

EePm

νω ν

=+

RF self-biased in RF plasma sources…….may cause damages in some processings

Plasma is in high positive voltage relative to substrates.thus, ions are accelerated to bombardment substrates

Advantages of Microwave Plasma

• High density plasma…..efficiently generate active radicals and particles for processing

• Electrodeless plasma generations…… low contaminations from sputtering of electrode or metal chamber wall.

• Low plasma potential and downstream processing…. low damages of electronic components.

Schematic of HTS Microwave Plasma Cleaner

magazine

vacuumpump

active particles

gas inletplasma

cylindrical microwavecavity

Quartz plate

microwave Source (magetron)

Uniqueness of HTS microwave plasma system

• Azimuthally symmetrical excitation of plasma…..special microwave power distribution.

• Uniform gas flow patterns …..azimuthally uniform distribution of injection holes of gas

…. better plasma and process uniformityPatent is pending

• High reliability system design… switching type power supply, and water cooling

HTS microwave plasma applications

• BGA and leadframe cleaning prior to die bond, wire bond and mold.

• Surface plasma cleaning and activation• Photoresist ashing

反應腔

功率源系統

真空系統

冷卻系統

氣體供應系統

量測系統

控制系統

HTS Plasma Source System

MRI , ITRI: 工研院材料所

HTS Microwave Plasma Cleaner for MRI in ITRI

Plasma Cleaning Processing Test

測試架構為六組規格35*35.MAG(上三組標記為1、2、3；下三組標記為4、5、6)

6 magazines on a rotational table in processing

Uniform in-magazine plasma cleaning by HTS

1 2 3 4 5 6 7 8 9MAG.1

MAG.50

20

40

60

80

100

Contactangle

Position Magazine

MAG.1MAG.2MAG.3MAG.4MAG.5MAG.6UNCLEAN

6 unslotted magazines simultaneous plasma processed , 4 min processing time

Capability of HTS Plasma Cleaner

• 6 un-slotted magazines can be processed simultaneously.

• Contact angle less than 35o can be achieved by microwave Power = 700 W

O2 gas pressure = 90 mTorr

Processing time = 4 min

HTS 與他牌微波電漿機台主要特性之比較

實驗結果証實HTS的微波電漿機台，比他牌微波電漿機台具有較強的電漿激發能力及1.5 倍的處理產能。

在微波功率源技術及冷卻方式，亦有很大的改進，能使系統更具可靠度及穩定性。

HTS Microwave Plasma Cleaner for LED Industry

LED BGA 基板

Improvement of bonding by Plasma Treatment

Plasma treated untreatedPeeling test

More uniform and stronger bonding after plasma cleaning

為何選擇HTS

技術本位，產品精良

關鍵組件自製，維修迅速

…..國內唯一高功率微波源自製公司

研發力強，配合顧客改善製程

Summary

The capabilities of HTS microwave plasma system have been successfully proved.

1. Unslotted magazine process2. Down stream plasma treatments3. Uniform surface processing 4. High throughput5. Cost effective

Thanks for your attention !

Plasma Surface TreatmentsPlasma Generation by MicrowaveRF self-biased in RF plasma sources�…….may cause damages in some processingsAdvantages of Microwave PlasmaUniqueness of HTS microwave plasma systemHTS microwave plasma applicationsPlasma Cleaning Processing TestUniform in-magazine plasma cleaning by HTSCapability of HTS Plasma CleanerHTS 與他牌微波電漿機台主要特性之比較HTS Microwave Plasma Cleaner for LED IndustryImprovement of bonding by Plasma Treatment為何選擇HTSSummary