“Complementi di Fisica” - Moodle@Units · Complementi di Fisica - Lecture 31 4-12-2012...
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Complementi di Fisica - Lecture 31 4-12-2012
L.Lanceri - Complementi di Fisica 1
“Complementi di Fisica”Lecture 31
Livio LanceriUniversità di Trieste
Trieste, 4-12-2012
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In this lecture• Contents
– Drift of electrons and holes in practice (numbers…):• conductivity σ as a function of impurity concentration• “band bending”: representation of macroscopic electric
fields– Diffusion in practice (numbers…):
• Diffusion coefficient D• Induced (“Built-in”) electric field• Einstein relation between σ and D
• Reference textbooks– D.A. Neamen, Semiconductor Physics and Devices, McGraw-
Hill, 3rd ed., 2003, p.154-188 (“5 Carrier Transport Phenomena”)– R.Pierret, Advanced Semiconductor Fundamental, Prentice
Hall, 2nd ed., p.175-215 (“6 Carrier Transport”)
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From the Boltzmann Equation…• The continuity equations for the electrical current density in
semiconductors can be obtained from the Boltzmannequation:
• Multiplying by the group velocity and integrating over themomentum space dkx dky dkz:
• One obtains the expression for current density(detailed derivation: see FELD p.187-194, MOUT p.100-104)
!f!t
= "! v g #! $ ! r f "
! F "#! $ ! k f "
f " f0
%! F = "e
! E
Force on electrons
! v g!f!t" d3
! k = #
! v g! v g $! % ! r f( )d3
! k " #
! v g
! F "$! % ! k f
&
' (
)
* + d3! k " #
! v gf # f0,
d3! k "
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Drift-diffusion continuity equation
relaxation time τ is small:This new term can be neglectedif frequency is not too high(few hundred MHz)
For electrons (similar for holes):
! n"! J n"t
+! J n = qnµn
! E + 1
nkBTq! # ! r n + kB
q! # ! r T
$
% &
'
( )
Drift Diffusion
Temperature gradient:also a temperature gradient can drive an electric current!Absent at thermal equilibrium
already discussed inthe Drude model
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• Drift (mobility) anddiffusion (diffusivity)coefficients arecorrelated!
• Why ?– See previous lecture– Also: no current at
equilibrium, see next
Drift and diffusion: Einstein relation
ppnn
ppnnth
qkTD
qkTD
EvEvlvD
µµ
µµ
!!"
#$$%
&=!!"
#$$%
&=
='=(
driftvelocity
thermalvelocity
externalfield
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Mobility and diffusivity vs. concentration
Electronsand holes:
Low dopingconcentration:Latticescatteringlimit
High dopingconcentration:Impurityscattering limit
pnpn mm µµ >!< ""
T ~ 300 K
mobility µ(cm2 V-1 s-1) diffusivity D
(cm2 s-1)
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“Band bending”:“built-in” electrical field
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Non-uniform doping: “built-in” field
qkT
V
dxdN
NV
dxdp
pV
dxdp
pVpq
dxdp
qkT
qpq
dxdp
DqpqJ
th
A
Athth
thn
nn
nnp
!
"=
=##$
%&&'
()=
=)=
=)=
11
01
0
µ
µµ
µ
Ɛ
Ɛ
Ɛ
Ɛ
p-type doping, thermal equilibrium (no “external” el.field applied!):
Ɛ is the “built-in” electric field:
“thermal voltage equivalent”
p(x)
n(x)
-N-A - n + p
Ɛ(x)
diffusion
Small “space charge” unbalance
Built-in field ⇒ drift
compensates diffusion
electrons
electrons
holes
holes
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Non-uniform doping in equilibrium• Under thermal and diffusive
equilibrium conditions the Fermilevel (= total chemical potential)inside a material (or group ofmaterials in intimate contact) isinvariant as a function of position
• A non-zero (“built-in”) electricfield is established innonuniformly dopedsemiconductors underequilibrium conditionsƐx = (1/ q)(dEC/dx) == (1/ q)(dEi/dx) == (1/ q)(dEV/dx)
0===dzdE
dydE
dxdE FFF
“band bending”, as for an external field; here the field is “built-in”
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Einstein relation - 1Relation between electron concentration, donor concentration,Fermi level EF and intrinsic Fermi level Ei in the “quasi-neutrality” approximation (local neutrality cannot be exact, otherwise there would be no built-in field!):
n x( ) = nieEF !Ei x( )( ) kT " ND x( )
At equilibrium, EF is constant ⇒ “band bending”:
EF ! Ei = kT lnND x( )ni
"
# $
%
& ' ( ! dEi
dx= kTND x( )
dND x( )dx
Induced (“built-in”) electric field:
! x = "dVdx
= "1
" qdEi
dx= "
kTq
1ND x( )
dND x( )dx
EC
EFEi
EV
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Einstein relation - 2At equilibrium the total electric current (diffusion + drift) must be zero; using for the electric field εx the expression just derived one obtains:Jn,x = 0 = q nµn! x + q Dn
dndx
"
" q ND x( )µn! x + q DndND x( )dx
=
= q ND x( )µn #kTq
1ND x( )
dND x( )dx
$%&
'()+ q Dn
dND x( )dx
EC
EFEi
EV
Dn
µn
= kTq
Dp
µp
= kTq
!
" # #
$
% & &
⇒ Einstein relation for electrons (similar for holes):
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Non-uniform doping: an example
⇒ Built-in electric field:
Ɛx = (1/ q)(dEi/dx) = = (1/ q)(d(EF-Ei)/dx) = = − dΨ/dx
Electric potential V(x) = Ψ(x) = (1/ q)(EF − Ei (x))
Donor concentration:
Equilibrium: EF = constant
“band bending”:
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Example:abrupt pn junction
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pn junction
n-typep-type
Built-in electric field
At thermal and diffusive equilibrium, no external field:Net current is zero, both for electrons and holes
drift
drift
diffusion
diffusion
electrons
holes
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Einstein relation – numerical examples• In the “non-degenerate” limit:
• Typical sizes of mobility and diffusivity:
qkTD
qkTD
p
p
n
n ==µµ
s/cm26Vs/cm1000
V026.0300
22n !"=
!"=
nDqkTKT
µ
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Current density equations• When an external electric field Ɛ is present in
addition to the concentration gradient: no equilibrium!– Both drift and diffusion currents will flow– The total current density is different from zero in this case!
• For electrons and holes: J = Jn + Jp
dxdp
DqpqJJJ
dxdn
DqnqJJJ
ppdiffpdriftpp
nndiffndriftnn
!=+=
+=+=
µ
µ
,,
,, Ɛ
Ɛ
drift diffusion
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High field effects
Drift velocity saturationAvalanche processes
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Drift velocity saturationSilicon: electrons and holes drift velocity- increases linearly at small fields- saturates (̃ thermal velocity) at high fields
GaAs: electrons and holes drift velocity- Peculiar behavior- see next slide for an explanation
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Two-valley semiconductors
GaAs: Two-valley model of E-k band diagram:Different effective massesDifferent mobilities
( )( ) ( )Ev
nnnnqnnnq
mq
n
c
µµµµ
µµµ!
"µ
=++#
=+=
= $
212211
2211
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Avalanche processesMean free path
Ek,min > Eg
To start an avalanche:enough kinetic energy to create an e-h pair
Order of magnitude estimatefrom energy and momentum conservation (process 1 → 2):
12m1vs
2 ! Eg + 312m1v f
2
m1vs ! 3m1v f
E0 = 12m1vs
2 !1.5 Eg
GA = 1q"n Jn + " p Jp( )
Band bending due toexternal field: Ɛx=(1/q)dEC/dx
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Ionization rates and generation rate
!n,! p ionization rates (cm-1)
e " h generation rate (cm-3s-1)
GA = 1q!n Jn + ! p Jp( )
In Silicon: E0 = 3.2 Eg (el.)E0 = 4.4 Eg (h.)
Ɛ ̃ 3×105 V/cmFor α ̃ 104 cm-1
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Lecture 31 - exercises• Exercise 1: Find the electron and hole concentrations, mobilities
and resistivities of silicon samples at 300K, for each of the followingimpurity concentrations: (a) 5x1015 boron atoms/cm3; (b) 2x1016
boron atoms/cm3 together with 1.5x1016 arsenic atoms/cm3; and (c)5x1015 boron atoms/cm3, together with 1017 arsenic atoms/cm3, and1017 gallium atoms/cm3.
• Exercise 2: For a semiconductor with a constant mobility ratio b ≡µnµp > 1 independent of impurity concentration, find the maximumresistivity ρm in terms of the intrinsic resistivity ρi and of the mobilityratio.
• Exercise 3: A semiconductor is doped with ND (ND>>ni) and has aresistance R1. The same semiconductor is then doped with anunknown amount of acceptors NA (NA>>ND), yielding a resistance of0.5R1. Find NA in terms of ND if the ratio of diffusivities for electronsand holes is Dn/Dp=50.
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Back-up slides
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Graded np junctionAD NNN !=
N: net fixed chargen0, p0: majority carrier concentrations
net mobile charge
net total charge
potential ΨEl.field Ɛx
electron energy-banddiagram